Raith Quantum™ high-speed beam blanker and software for precision electron beam lithography up to 30 kV.
Bruker XFlash® 6|30 EDX and e-FlashHR EBSD detectors, for materials and elemental analysis
The AML boasts a class 10000 cleanroom with fume hoods, wet bench, and spinners for resist based lithography.
X-Ray Diffractometer
Model- PANanalytical X'Pert Pro MRD
HR-XRD (symmetric and asymmetric rocking curve and coupled-scan measurements) for thin films.
Reciprocal space mapping.
Reflectivity measurements.
Epitaxy software for advanced modeling of layered structures.
Coupled 2θ-⍵scans for phase analysis for powder diffraction
Transmission Electron Microscope
Model-Jeol 2100 High-Resolution TEM
Multipurpose 200 kV TEM with simple and ease-of-use operability and excellent expandability
Excellent LaB6 electron gun promises excellent performance with a reasonable cost.
Ultrahigh TEM resolution as high as 0.19 nm (in UHR configuration) enables us to perform an observation at atomic resolution.
STEM (Scanning Transmission Electron Microscope: option) function integrated in PC control system enables us to see a scanning image of a sample at nanometer resolution.
EDS (Energy Dispersive X-ray Spectrometer) with a 0.28sr of solid angle (in HR configuration with a 50mm2 detector) performs highly sensitive analysis at nanometer resolution.
Highly stable specimen stage enables us to perform a long term observation and analysis.